Title of article
Surface modification of doped ZnO thin films
Author/Authors
S. Flickyngerova، نويسنده , , J. Skriniarova، نويسنده , , M. Netrvalova، نويسنده , , J. Kovac Jr.، نويسنده , , I. Novotny، نويسنده , , P. Sutta، نويسنده , , V. Tvarozek، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2010
Pages
4
From page
5606
To page
5609
Abstract
Effects of photo-assisted electrodeless and ion RF-sputter etching on the structural and optical properties of sputtered ZnO:Al thin films were investigated. Photo-assisted electrodeless etching was appropriate for getting “smooth” surfaces and ion RF-sputter etching by high power has significantly modified the surface roughness with an increase of the light diffuse transmittance.
Keywords
Sputtering , Thin-film solar cell , ZnO:Al
Journal title
Applied Surface Science
Serial Year
2010
Journal title
Applied Surface Science
Record number
1012910
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