Title of article :
Passivation of aluminum with alkyl phosphonic acids for biochip applications
Author/Authors :
Sachin Attavar، نويسنده , , Mohit Diwekar، نويسنده , , Matthew R. Linford*، نويسنده , , Mark A. Davis، نويسنده , , Steve Blair، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2010
Abstract :
Self-assembly of decylphosphonic acid (DPA) and octadecylphosphonic acid (ODPA) was studied on aluminum films using XPS, ToF-SIMS and surface wettability. Modified aluminum films were tested for passivation against silanization and subsequent oligonucleotide attachment. Passivation ratios of at least 450:1 compared to unprotected aluminum were obtained, as quantified by attachment of radio-labeled oligos.
Keywords :
DNA metallic microarray , Biosenor , Phosphonic acid self-assembled monolayer
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science
