Title of article
Passivation of aluminum with alkyl phosphonic acids for biochip applications
Author/Authors
Sachin Attavar، نويسنده , , Mohit Diwekar، نويسنده , , Matthew R. Linford*، نويسنده , , Mark A. Davis، نويسنده , , Steve Blair، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2010
Pages
5
From page
7146
To page
7150
Abstract
Self-assembly of decylphosphonic acid (DPA) and octadecylphosphonic acid (ODPA) was studied on aluminum films using XPS, ToF-SIMS and surface wettability. Modified aluminum films were tested for passivation against silanization and subsequent oligonucleotide attachment. Passivation ratios of at least 450:1 compared to unprotected aluminum were obtained, as quantified by attachment of radio-labeled oligos.
Keywords
DNA metallic microarray , Biosenor , Phosphonic acid self-assembled monolayer
Journal title
Applied Surface Science
Serial Year
2010
Journal title
Applied Surface Science
Record number
1013169
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