Title of article
Preparation of p-type CdS thin films and in situ dark conductivity in vacuum deposited CdS:Cu films
Author/Authors
Hanke Xie، نويسنده , , Caijuan Tian، نويسنده , , Wei Li، نويسنده , , Lianghuan Feng، نويسنده , , Jingquan Zhang، نويسنده , , Lili Wu، نويسنده , , Yaping Cai، نويسنده , , Zhi-Lei Sun، نويسنده , , Yujin Yang، نويسنده ,
Issue Information
روزنامه با شماره پیاپی سال 2010
Pages
5
From page
1623
To page
1627
Abstract
CdS:Cu thin films were prepared using a vacuum co-evaporation technique. The Hall measurements indicate that the conductivity characteristic of CdS thin films transformed from highly compensated in as-grown or weakly annealed materials to p-type conductive in strongly annealed materials. X-ray diffraction spectra show that as-deposited thin films were the hexagonal phase of CdS except the presence of copper for high Cu doping and the diffraction peaks of Cu disappeared after annealing. From the X-ray photoelectron spectroscopy we found the ionization of Cu atoms and the formation of an acceptor level. In situ dark conductivity in vacuum as-deposited CdS:Cu was performed in the temperature range between 27 and 250 °C. An abnormal temperature dependence of conductivity was observed in medium and heavily Cu-doped films. The formation of a p-type material at a certain temperature was also studied by the hot probe measurements, which indicates a complex compensation process in the Cu-doped CdS films.
Keywords
p-Type conductivity , Compensation mechanism , CdS thin films
Journal title
Applied Surface Science
Serial Year
2010
Journal title
Applied Surface Science
Record number
1013533
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