• Title of article

    Effects of the Hf content on the microstructure and magnetic properties of Co–Hf–Ta thin films

  • Author/Authors

    Shu-Wen Huang، نويسنده , , Yuan-Tai Lai، نويسنده , , Jenq-Gong Duh، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2011
  • Pages
    4
  • From page
    2042
  • To page
    2045
  • Abstract
    Effects of the Hf content in Co–Hf–Ta thin films on the microstructure and magnetic properties were investigated in this study. It was found that appropriate Hf addition can effectively refine the Co grain size. Co grain sizes sharply decreased from 50 nm down to 2.3 nm with increasing the Hf content from 1.02 at.% to 2.81 at.%, leading to the reduced magneto-crystalline anisotropy. The Co–Hf–Ta thin films with small Co grains reveal low anisotropy field, low coercivity, and high resistivity. By optimizing the Hf content, the film with Hf concentration of 2.81 at.% exhibits excellent soft magnetic properties: high saturation magnetization (4πMS ∼ 13.6 kG), and low coercivity (HC ∼ 0.6 Oe). The effective permeability of the film reaches 800 and remains constant up to 1 GHz.
  • Keywords
    Co–Hf–Ta , Permeability , Magnetic thin films , Magneto-crystalline anisotropy
  • Journal title
    Applied Surface Science
  • Serial Year
    2011
  • Journal title
    Applied Surface Science
  • Record number

    1013606