Title of article :
Effect of different annealing temperature on Sb-doped ZnO thin films prepared by pulsed laser deposition on sapphire substrates
Author/Authors :
Ziwen Zhao، نويسنده , , Lizhong Hu، نويسنده , , Heqiu Zhang، نويسنده , , Jingchang Sun، نويسنده , , Jiming Bian، نويسنده , , Jianze Zhao، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2011
Abstract :
Influence of annealing temperature on the properties of Sb-doped ZnO thin films were studied. Hall measurement results indicated that the Sb-doped ZnO annealed at 950 °C was p-type conductivity. X-ray diffraction (XRD) results indicated that the Sb-doped ZnO thin films prepared at the experiments are high c-axis oriented. It was worth noting that p-type sample had the worst crystallinity. The measurements of low-temperature photoluminescence (PL) spectra indicate that the sample annealed at the temperatures of 950 °C showed strong acceptor-bound exciton (A0X) emission, and confirmed that it is related to Sb-doping by comparing with the undoped ZnO low-temperature PL spectrum.
Keywords :
Sb-doped ZnO , Pulsed laser deposition , X-ray diffraction , Scan electronic microscopy , Photoluminescence spectra , Hall-effect-measurement
Journal title :
Applied Surface Science
Journal title :
Applied Surface Science