Title of article :
Structural, optical and electrical properties of Zn1−xCdxO thin films prepared by PLD
Author/Authors :
BJ Zheng، نويسنده , , J.S. Lian*، نويسنده , , L. Zhao، نويسنده , , Q. Jiang، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2011
Pages :
6
From page :
5657
To page :
5662
Abstract :
Ternary polycrystalline Zn1−xCdxO semiconductor films with cadmium content x ranging from 0 to 0.23 were obtained on quartz substrate by pulse laser deposited (PLD) technique. X-ray diffraction measurement revealed that all the films were single phase of wurtzite structure grown on c-axis orientation with its c-axis lattice constant increasing as the Cd content x increasing. Atomic force microscopy observation revealed that the grain size of Zn1−xCdxO films decreases continuously as the Cd content x increases. Both photoluminescence and optical measurements showed that the band gap decreases from 3.27 to 2.78 eV with increasing the Cd content x. The increase in Cd content x also leads to the broadening of the emission peak. The resistivity of Zn1−xCdxO films decreases evidently for higher values of Cd content x. The shift of PL emission to visible light as well as the decrease of resistivity makes the Zn1−xCdxO films potential candidate for optoelectronic device.
Keywords :
Zn1?xCdxO films , Pulse laser deposition , Transparent conductor oxide , Hall effect
Journal title :
Applied Surface Science
Serial Year :
2011
Journal title :
Applied Surface Science
Record number :
1014225
Link To Document :
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