Title of article :
X-ray photoelectron spectroscopic analysis of the surface chemistry of silica nanowires
Author/Authors :
Miles F. Beaux II، نويسنده , , Nathan J. Bridges، نويسنده , , Morgan DeHart، نويسنده , , Thomas E. Bitterwolf، نويسنده , , David N. McIlroy، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 2011
Pages :
6
From page :
5766
To page :
5771
Abstract :
A thorough analysis of the surface chemistry of silica nanowires has been performed by X-ray photoelectron spectroscopy to investigate unexpected surface changes. Examination of the Si 2p, O 1s, and C 1s core level states before and after exposure of the nanowires to various liquid media showed that silica nanowires are capable of much higher surface hydroxyl concentrations than planar native oxides. It is further demonstrated that the nanowire surface hydroxyl concentration corresponds to the pH of the aqueous media to which the nanowires are exposed. Spectral feature changes due to water exposure similar to those observed for fibronectin binding suggests that fibronectin binding is competitively inhibited by slow changes in surface chemistry resulting from water exposure.
Keywords :
XPS , Silica , Nanowire , Surface chemistry
Journal title :
Applied Surface Science
Serial Year :
2011
Journal title :
Applied Surface Science
Record number :
1014242
Link To Document :
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