• Title of article

    Chemical effects during ripple formation with isobaric ion beams

  • Author/Authors

    S. Sarkar، نويسنده , , A. Franquet، نويسنده , , A. Moussa، نويسنده , , W. Vandervorst، نويسنده ,

  • Issue Information
    روزنامه با شماره پیاپی سال 2011
  • Pages
    5
  • From page
    6424
  • To page
    6428
  • Abstract
    The formation of nanostructures on SiGe surfaces by erosion using mixed beams of isobaric species (Cs/Xe) is shown to depend on the Cs/Xe ratio. The nanostructures exhibit different wavelengths (longer wavelengths for higher Cs concentrations) contrary to the present theoretical understanding. Moreover, experiments with pure Cs and Xe beams also demonstrate that such differences are enhanced at lower bombarding energies. Such effects are primarily due to the fact that the retentivity and mobility of cesium at the sample surface gets enhanced at lower bombarding energies. The phenomenon could be explained theoretically by including an additional diffusion term in the growth equation describing the mobility of the primary ions on the irradiated surface. Semi-empirical calculations done in this direction also confirm this phenomenon.
  • Keywords
    Nanopatterning , Sputtering , atomic force microscopy
  • Journal title
    Applied Surface Science
  • Serial Year
    2011
  • Journal title
    Applied Surface Science
  • Record number

    1014350