The effect of Co ion implantation on Ge1−xMnx films

Ge1−xMnx (x = 0, 0.013, 0.0226, 0.0339, 0.0565, 0.0678, 0.0904, 0.113) films prepared by magnetron sputtering at 773 K had a Ge cubic structure except for x = 0.1130. Co ion implantation into these films can effectively prevent the formation of a second phase. Both single-doped and co-doped samples were ferromagnetic at room temperature. The d–d exchange interaction between the interstitial Mn (MnT) and the substituted Mn (MnGe) resulted in ferromagnetism in the sputtered films. Since Co ion implantation destroyed the MnT–MnGe–MnT complex, the saturated magnetization decreased. Hall measurements revealed that the Co ion implanted films were n-type semiconductors, and the anomalous Hall Effect (AHE) suggested the ferromagnetism was carrier-mediated in the implanted films.