Localized grafting through chemical lift-off

In this work we present two techniques that provide localized functionalization of the surface of materials. Both lead to localized grafted thin organic films (10–200 nm). The localization is brought by a chemical lift-off process, which relies on patterned weakly bonded films as sacrificial layers, combined with electrochemical (SEEP) or chemical (GraftFast©) processes which provides the final robust pattern on the surface. Both grafting processes, which were recently described, take advantage of the redox activation of diazonium salts associated with vinylic monomers in aqueous solution, and lead to similar grafted polymer films. Thanks to the high difference in adhesion between the grafted polymer and the patterned sacrificial layer (either an ink or weakly bound self-assembled monolayers), the latter may be easily removed, which unveils uncovered areas of the substrate.