Author/Authors :
.Fanaei S، T نويسنده Electrical and Electronic Department, University of Sistan and Baluchestan, Zahedan, I.R.Iran , , Zahed، .B نويسنده Mechanical Engineering Department, University of Sistan and Baluchestan, Zahedan, I.R. Iran , , Ateshi، H نويسنده Chemical Engineering Department, University of Sistan and Baluchestan, Zahedan, I.R. Iran ,
Abstract :
The growth rate and uniformity of Carbon Nano Tubes (CNTs) based on Chemical Vapor Deposition (CVD)
technique is investigated by using a numerical model. In this reactor, inlet gas mixture, including xylene as
carbon source and mixture of argon and hydrogen as carrier gas enters into a horizontal CVD reactor at
atmospheric pressure. Based on the gas phase and surface reactions, released carbon atoms are grown as CNTs
on the iron catalysts at the reactor hot walls. The effect of inlet gas-mixture flow rate, on CNTs growth rate and
its uniformity is discussed. In addition the velocity and temperature profile and also species concentrations
throughout the reactor are presented.
