Title of article
Hybrid integration of GaAs/AlGaAs in-plane-gate resonant tunneling and field effect transistors
Author/Authors
S.H. Son، نويسنده , , M.G. Kang، نويسنده , , S.W. Hwang، نويسنده , , J.I. Lee، نويسنده , , Y.J. Park، نويسنده , , Y.S. Yu، نويسنده , , D. Ahn، نويسنده ,
Issue Information
دوهفته نامه با شماره پیاپی سال 2008
Pages
3
From page
2160
To page
2162
Abstract
We report the fabrication and characterization of a planar-type resonant tunneling device–field effect transistor (RTD–FET) hybrid circuit. Our hybrid circuit utilizes in-plane-type gates, which can control the potential of the quantum RTD quantum dot (QD) and FET channel. Transport measurements through the fabricated RTD–FET hybrid circuit exhibited the shift of the negative differential resistance peaks both as functions of the RTD gate and the FET gate. The slope of the current contour plot showed that the coupling capacitance of the FET gate to the QD is 1/20 of that of the FET gate. Our hybrid circuit successfully showed multi-valued inverter characteristics.
Keywords
Quantum dot , In-plane gate , Hybrid circuit , Negative differential resistance
Journal title
Physica E Low-dimensional Systems and Nanostructures
Serial Year
2008
Journal title
Physica E Low-dimensional Systems and Nanostructures
Record number
1047323
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