Investigation of conditions for preparation of oriented nanotubes at department of microelectronics in a modified plasma-enhanced hot filament chemical vapor deposition reactor

This paper describes the preparation of nanotubes on copper, iron and on silicon wafers with pre-deposited diffusion barrier and catalyst particles. Experimental results describe the influence of an additional electrode on the growth and orientation of the nanotubes in the hot filament chemical vapor deposition reactor. Implementation of an electrode in the Hot Filament Chemical Vapor Deposition reactor has a considerable influence on the conditions in the reactor and growth of oriented nanotubes. The effect of pressure on the orientation was observed.