Investigation of the performance and band-to-band tunneling effect of a new double-halo-doping carbon nanotube field-effect transistor

Carbon nanotube field-effect transistors (CNTFETs) can be fabricated with Ohmic- or Schottky-type contacts. We focus here on Ohmic CNTFETs. The CNTFETs suffer from band-to-band tunneling which in turn causes the ambipolar conduction. In this paper, to suppress the ambipolar behavior of CNTFETs and improve the performance of these devices, we have proposed application of symmetric double-halo (DH)-doping in CNTFETs. In this new structure, the source-side halo doping reduces the drain-induced barrier lowering (DIBL) and the drain-side halo reduces the band-to-band tunneling effect. Simulation results show in the DH-CNTFET, subthreshold swing below the 60 mV/decade conventional limit can be achieved. Also it decreases significantly the leakage current and drain conductance and increases on–off current ratio and voltage gain as compared to conventional CNTFET.