Title of article
Surface state control of III–V semiconductors using molecular modification
Author/Authors
Fumihiko Yamada، نويسنده , , Takeo Shirasaka، نويسنده , , Kosei Fukui، نويسنده , , Itaru Kamiya، نويسنده ,
Issue Information
ماهنامه با شماره پیاپی سال 2009
Pages
5
From page
2841
To page
2845
Abstract
An attempt to control surface electronics of III–V semiconductor using wet chemical processes has been performed. Here, we report results on the use of self-assembled monolayers (SAMs) of organic molecules on (0 0 1) GaAs surface. Octadecanethiol (ODT) and benzenethiol (BT) have been the choice in the present study.
GaAs wafers were modified by thiol molecules on the flat surface after the native oxide layers are removed by chemical etching under optimized conditions. The change in the electronic properties was measured in terms of transport properties via the SAM layer by conductive probe atomic force microscopy. The current–voltage characteristics thus obtained show that ODT functions as a tunnel barrier while BT is conductive due to the presence of π-electrons. As a result, we can control the electronic states of GaAs–molecule interface for realizing novel device structures by the selection of functional molecules.
Keywords
Surface states , Molecular modification , Nano electronics , Wet etching
Journal title
Physica E Low-dimensional Systems and Nanostructures
Serial Year
2009
Journal title
Physica E Low-dimensional Systems and Nanostructures
Record number
1048470
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