Electronic transport characteristics in silicon nanotube field-effect transistors

The successful synthesis of silicon nanotubes (SiNTs) has been reported, making these nanostructures a new novel candidate for future nanodevices. By self-consistently solving the Poisson equations using the non-equilibrium Greenʹs function (NEGF) formalism, we investigate the electronic transport and the role of gate bias in affecting the drive current of single-walled silicon nanotube (SW-SiNT) field-effect transistors (FETs). By comparison of a SW-CNT FET, it is found that the SW-SiNT with a high-k HfO gate oxide is a promising candidate for nanotube transistor with better performance. The results discussed here would serve as a versatile and powerful guideline for future experimental studies of SW-SiNT-based transistor with the purpose of exploring device application for nanoelectronics.