Stability of carbon nanowalls against chemical attack with acid solutions

In this paper we report on the stability of CNW layers, synthesized by a radiofrequency plasma jet, against the chemical attack with different acid solutions (sulfuric acid, nitric acid, hydrochloric acid, and hydrofluoric acid). We present the changes of the morphology and structure of the CNW caused by the post-growth chemical treatments. We demonstrate that self-sustaining and transferable CNW layers can be obtained, by chemically dissolving the substrates, while the initial characteristics of the material are well preserved.