Title of article
The thermopower of a high-mobility Si-MOSFET around the metal-insulator transition
Author/Authors
R Fletcher، نويسنده , , V.M. Pudalov، نويسنده , , M Tsaousidou، نويسنده , , P.N Butcher، نويسنده ,
Issue Information
دوهفته نامه با شماره پیاپی سال 2000
Pages
4
From page
272
To page
275
Abstract
The thermopower of a high-mobility Si-MOSFET sample has been measured as a function of electron density around the metal–insulator transition over the temperature range of about 0.5–4 K. Both diffusion and phonon drag effects are clearly seen, the latter for the first time in an insulator. Each contribution appears to vary smoothly through the MIT without reflecting the strong variation observed in the conductivity.
Keywords
Metal-insulator , Thermopower , Hopping
Journal title
Physica E Low-dimensional Systems and Nanostructures
Serial Year
2000
Journal title
Physica E Low-dimensional Systems and Nanostructures
Record number
1049635
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