Title of article :
Low-frequency resistance noise studies across the metal–insulator transition in silicon MOSFETs
Author/Authors :
J. Jaroszynski، نويسنده , , Dragana Popovi?، نويسنده , , T.M. Klapwijk، نويسنده ,
Issue Information :
دوهفته نامه با شماره پیاپی سال 2002
Pages :
4
From page :
612
To page :
615
Abstract :
Strong 1/fγ resistance noise is observed in the insulating phase in a two-dimensional electron system in high-mobility silicon metal-oxide-semiconductor field-effect transistors (MOSFETs). The noise power increases with decreasing temperature. This suggests the formation of the electron glass at low carrier densities.
Keywords :
Metal-insulator transition , Resistance noise
Journal title :
Physica E Low-dimensional Systems and Nanostructures
Serial Year :
2002
Journal title :
Physica E Low-dimensional Systems and Nanostructures
Record number :
1050175
Link To Document :
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