Title of article :
Investigation of self-aligned p++-GaAs/n-InGaP heterojunction field-effect transistors
Author/Authors :
Lour، Wen-Shiung نويسنده , , M.-K. Tsai، نويسنده , , K.-C. Chen، نويسنده , , S.-W. Tan، نويسنده , , Y.-W. Wu، نويسنده , , Y.-J. Yang، نويسنده ,
Issue Information :
دوهفته نامه با شماره پیاپی سال 2002
Abstract :
p++-GaAs/n-InGaP heterojunction field-effect transistors (HJFETs) with a highly carbon-doped gate and a wide-gap channel were reported. A self-aligned T-shaped gate HJFET exhibits a gate of View the MathML source in length by depositing gate metal of View the MathML source. DC characteristics including a turn-on voltage of View the MathML source at View the MathML source, a gate-drain breakdown voltage up to View the MathML source, a drain-source breakdown voltage exceeding View the MathML source, a maximum available transconductance of View the MathML source and AC performances such as a unit-current gain frequency of View the MathML source, and a unit-power gain frequency of View the MathML source were obtained for a non-self-aligned HJFET. With a self-aligned processing structure, the transconductance and fmax were improved to View the MathML source and View the MathML source, respectively.
Keywords :
Self-aligned , Heterojunction field-effect transistor , T-shaped gate
Journal title :
Physica E Low-dimensional Systems and Nanostructures
Journal title :
Physica E Low-dimensional Systems and Nanostructures