Title of article
Evidence for high negative charge densities in AlF3 coatings on oxidized silicon: a promising source for large drift fields
Author/Authors
Dirk K?nig، نويسنده , , G. Ebest، نويسنده , , R. Scholz، نويسنده , , S. Gemming، نويسنده , , I. Thurzo، نويسنده , , T.U. Kampen and K. Horn، نويسنده , , D.R.T. Zahn، نويسنده ,
Issue Information
دوهفته نامه با شماره پیاپی سال 2002
Pages
4
From page
259
To page
262
Abstract
Fixed negative charges in coatings of silicon solar cells can serve as an efficient source for large drift fields, thereby passivating the silicon surface and improving charge separation of the electron–hole pairs. In the present work, we report on the evidence for a high negative charge density in AlF3 coatings on oxidized silicon. The existence of these charges is related to sub-stoichiometric Fluorine content close to the AlF3/SiO2 interface, as evidenced both in measurements and density functional calculations of an electron trapped in a fluorine vacancy.
Keywords
Electron localization , Fixed charges , Fluorine , Density functional calculations , Drift fields
Journal title
Physica E Low-dimensional Systems and Nanostructures
Serial Year
2002
Journal title
Physica E Low-dimensional Systems and Nanostructures
Record number
1050575
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