Effect of accelerating voltage on crystallization of self-standing W-nanodendrites fabricated on SiO2 substrate with electron-beam-induced deposition

Self-standing W-nanodendrite structures were grown on SiO2 substrate using an electron-beam-induced deposition (EBID) process with various accelerating voltages from 400 to 1000 kV. Effect of accelerating voltage on crystallization of the nanodendrites was investigated. The nanodendrites consisted of nano-sized grains and amorphous structures. The nano-sized grains were determined to be W crystal in BCC structure. The higher was electron beam accelerating voltage, the higher was crystallinity of the as-fabricated nanodendrites. It is suggested that high-energy electron irradiation enhances diffusion of W atoms in the nanodendrites, promotes crystallization of W grains.