Dependence on substrate topography of growth of nanosized dendritic structures in an electron-beam-induced deposition process

Nanometer-sized W-dendrites are fabricated on Al2O3 substrates with an electron-beam-induced deposition process. Dependence of growth of nanodendrite on surface topography is investigated with transmission electron microscopy. It is confirmed that the nanodendrite grows on convex surfaces but not around a hole on a substrate. These are attributed to different distribution of charges on surfaces with different topographies during electron beam irradiation when charges are produced on the surface due to emission of second electrons. The charges accumulate on convex surface and do not distribute around a hole. Therefore, the nanodendrite grows on the former and not on the latter.