Simple and controlled fabrication of nanoscale gaps using double-angle evaporation

A simple and controlled method for fabricating nanometer-spaced electrodes is presented. This method uses electron-beam lithography followed by double-angle evaporation of thin metallic films. By simply changing the film thickness, one can adjust the separation of the electrodes. In this method, error is caused mainly by the granularity of the deposited metals. We have observed the Coulomb blockade effect of 20 nm Au colloidal particles captured in a gap fabricated using this method.