Title of article :
Si:2p site-specific excitation and fragmentation of bridged trihalosilyl–trimethylsilyl molecules: role of the bridge and final-state effect Original Research Article
Author/Authors :
Shin-Ichi Nagaoka، نويسنده , , Tonan Fujibuchi، نويسنده , , Joji Ohshita، نويسنده , , Umpei Nagashima، نويسنده , , Inosuke Koyano، نويسنده ,
Issue Information :
هفته نامه با شماره پیاپی سال 2002
Pages :
14
From page :
243
To page :
256
Abstract :
To elucidate site-specific phenomena, we experimentally and computationally studied the spectroscopy and dynamics caused by Si:2p core-level photoexcitation of bridged trihalosilyl–trimethylsilyl molecules. We used the photoionization efficiency curve and the photoelectron photoion coincidence method to study the site-specific phenomena in the Si:2p photoexcitation of F3SiCH2CH2CH2Si(CH3)3, F3SiCHCHSi(CH3)3 and Cl3SiCCSi(CH3)3 in the vapor phase. The site-specific excitation was revealed in the photoionization efficiency curves of all the molecules. The site-specific fragmentation is likely to be more evident when the distance between the two Si sites is large. For the site-specific fragmentation to be caused by the Si:2p photoexcitation, there should not be a CC bond between the atomic site of interest and any other near atomic site around which bond dissociation is undesirable. Not only initial-state effect but also final-state effect is likely to contribute to the occurrence of the different chemical shifts between the two Si sites of the bridged trihalosilyl–trimethylsilyl molecules.
Keywords :
Site-specific phenomena , Si:2p core-level photoexcitation , Bridged trihalosilyl–trimethylsilyl molecule
Journal title :
Chemical Physics
Serial Year :
2002
Journal title :
Chemical Physics
Record number :
1056941
Link To Document :
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