The effect of copper ions on interaction of UV radiation with methacrylic matrix – EPR study

The role of metal ions introduced to polymer matrix in the photochemical degradation of material is not fully understood. In this paper, we considered the effect of copper ions on the photochemical changes in Methafilcon A after UV-irradiation. The presence of methacrylic acid in the structure of Methafilcon A increases the loading capacity of these ions. In result, there is observed the production much more radicals after UV-irradiation than in pure matrix, without copper ions. When the time of UV-exposure increases, the EPR signal of trapped Cu(II) ions in the material decreases. This proves the transformation of Cu(II) to a diamagnetic state of stable Cu(I)-intermediates or copper oxides. Simultaneously, in the first 5-min of UV-irradiation there is observed a rapid increase in intensity of the radical signal, which disappears when the exposure time is extended. This mechanism of radical generating is quite different than for Methafilcon A matrix without copper ions.