• Title of article

    Growth behaviour of polyaniline films deposited by pulse potentiostatic method

  • Author/Authors

    V. Rajendran and B. H. Chen، نويسنده , , A. Gopalan، نويسنده , , T. Vasudevan، نويسنده , , Wei-Chih Chen، نويسنده , , Ten-Chin Wen، نويسنده ,

  • Issue Information
    دوهفته نامه با شماره پیاپی سال 2000
  • Pages
    9
  • From page
    320
  • To page
    328
  • Abstract
    Electrochemical polymerisation of aniline (ANI) was performed in aqueous 0.5 M H2SO4 using pulse potentiostatic method (PPSM). The polymeric films were deposited under different tuneable pulse parameters in PPSM like pulse number (Pn), pulse width (Pw) and variations of aniline concentrations. Cyclic voltammetry was used for evaluating the characteristics of the deposited polymeric films. A suitable equation relating the growth of the deposited films and the pulse parameters in PPSM was deduced as: growth=k[ANI]PnPw where k is growth rate constant and k value was evaluated through growth function. Various surface parameters were evaluated. The surface excess and thickness of the film showed increasing trend with increasing [ANI] and Pn. The polymer was also characterised in various acidity conditions. The elcectroactivity of the film was found to be retained in highly acidic solution and showed decreasing activity with increasing pH.
  • Keywords
    Pulse potentiostatic , Tuneable pulse parameters , Deposited films , Growth characteristics
  • Journal title
    Materials Chemistry and Physics
  • Serial Year
    2000
  • Journal title
    Materials Chemistry and Physics
  • Record number

    1060335