Title of article
Modeling of aerosol deposition of titania thin films
Author/Authors
Fausto Di Muzio، نويسنده , , Maurizio Masi، نويسنده , , Sergio Carrà، نويسنده ,
Issue Information
دوهفته نامه با شماره پیاپی سال 2000
Pages
8
From page
286
To page
293
Abstract
The size-controlled TiO2 particles are usually employed in semiconductor devices, catalysis and photo-catalysis, adsorption and optical technology. In this work, the kinetics of the aerosol process involving the precursor tetraisopropyl orthotitanate (TPT) and water as reactants kept in supercritical conditions (using CO2 as solvent) and a detailed description of the fluid dynamic variables coupled with the statistical distribution of the particles inside the reactor are investigated. A turbulent diffusive flow is forced into the reactor to guarantee a complete conversion of the reactants and the production of small diameter particles. Furthermore, the particle formation can be well represented by means of the general dynamic equation (GDE). To allow a coupling between the solution of the fluid dynamic fields and the representation of the particle evolution within the reactor, the method of moments was applied to GDE to determine the most important statistical variables of a particle.
Keywords
Titania , Aerosol , Modeling , Particle size distribution , Powders , Thin films
Journal title
Materials Chemistry and Physics
Serial Year
2000
Journal title
Materials Chemistry and Physics
Record number
1060383
Link To Document