Title of article
Influence of low temperature thermal annealing on the dark resistivity of chemical bath deposited CdS films
Author/Authors
K.V. Zinoviev، نويسنده , , O. Zelaya-Angel، نويسنده ,
Issue Information
دوهفته نامه با شماره پیاپی سال 2001
Pages
3
From page
100
To page
102
Abstract
CdS thin films were grown by chemical bath on glass substrates and exposed to different annealing atmospheres over the range of temperatures 200–350°C. Electrical, structural and optical properties as well stoichiometry of the films were investigated. Large changes on resistivity as a function of annealing temperature, and a limited temperature region yielding films with very low resistivity were found. Resistivity values as low as 0.05 Ω cm are attained at the interval of temperature 240–260°C in H2 atmosphere. Resistivity values exhibit sharp increase in the region 260–300°C as a result of the film-stoichiometry change on account of Cd evaporation.
Keywords
Resistivity , CdS , Chemical bath , Thin films
Journal title
Materials Chemistry and Physics
Serial Year
2001
Journal title
Materials Chemistry and Physics
Record number
1060541
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