Studies on large area (∼50 cm2) MoS2 thin films deposited using successive ionic layer adsorption and reaction (SILAR) method

A simple method, successive ionic layer adsorption and reaction (SILAR), has been used to deposit MoS2 thin films onto various substrates using ammonium molybdate and sodium sulfide as cation and anion precursor solutions, respectively. Preparative parameters such as concentration, pH and temperature of cation and anion precursor solutions and adsorption, reaction and rinsing time durations were optimized to get good quality films. The films were deposited onto microsolide glass, fluorine doped tin oxide (FTO) coated glass and Si (1 1 1) wafer substrates. The versatility of the method was checked by depositing the films onto (∼50 cm2) glass substrates. X-ray diffraction, optical absorption, electrical resistivity and thermoemf measurement techniques were used for characterization of the films.