Title of article
Preparation of platinum silicide films by pulsed laser deposition and pulsed laser annealing
Author/Authors
Mei Cheng Li، نويسنده , , Xuekang Chen، نويسنده , , Wei Cai، نويسنده , , Jinghua Yin، نويسنده , , Jianping Yang، نويسنده , , Gan Wu، نويسنده , , LIANCHENG ZHAO، نويسنده ,
Issue Information
دوهفته نامه با شماره پیاپی سال 2001
Pages
3
From page
85
To page
87
Abstract
The formation of PtSi ultra-thin films prepared by pulsed laser deposition during pulsed laser annealing has been studied. The growth sequence of the Pt2Si and the PtSi phases that evolved as the result of the diffusion reaction in the bilayers was examined by X-ray photoelectron spectroscopy (XPS) and the structure characteristics of PtSi were investigated by XPS. X-ray diffraction (XRD) and atomic force microscopy (AFM). Superb uniformity of PtSi films and smooth PtSi/Si interfaces were obtained by pulsed laser annealing.
Keywords
Pulsed laser deposition , Laser annealing , Nanometer thin film
Journal title
Materials Chemistry and Physics
Serial Year
2001
Journal title
Materials Chemistry and Physics
Record number
1060648
Link To Document