Title of article
Bonding structure of CNx films synthesized by nitrogen implantation into diamond films
Author/Authors
Peijiang Cao، نويسنده , , W.T. Zheng and Chang Q. Sun، نويسنده , , Cisco Systems Zhigang Jiang، نويسنده , , Zengsun Jin، نويسنده , , Zongxin Mu، نويسنده , , Chuang Dong، نويسنده ,
Issue Information
دوهفته نامه با شماره پیاپی سال 2001
Pages
4
From page
93
To page
96
Abstract
The CNx films were synthesized by nitrogen ion (with the energy of 10 and 60 keV, respectively) implantation into diamond films. The bonding structure of the implanted films as well as diamond films was investigated using both Raman spectroscopy and X-ray photoelectron spectroscopy (XPS). For the diamond film implanted by 10 keV nitrogen ions. Raman spectrum exhibits stronger diamond peak at 1332 cm−1 and a weak graphitic peak (G band) at 1550 cm−1, while N 1s XPS data show two main peaks at ∼398.5 and 400.0 eV, respectively. As for the diamond film implanted by 60 keV nitrogen ions, the dominant peak in N 1s XPS spectrum locates at ∼400.0 eV. Correspondingly, the graphitic peak in Raman spectrum becomes pronounced. By comparison with the Raman spectra, the assignments of C 1s and N 1s binding states in XPS for the implanted films are made, in which the peaks at ∼285.9 and 400.0 eV are attributed to CN sp2 bonding, whereas the peaks at ∼287.8 and 398.5 eV are ascribed to CN sp3 bonding.
Keywords
N-implantation , Bonding structure , Diamond
Journal title
Materials Chemistry and Physics
Serial Year
2001
Journal title
Materials Chemistry and Physics
Record number
1060650
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