Title of article
The rapid growth of thin transparent films of diamond
Author/Authors
Hsiao-Kuo Chung، نويسنده , , James C. Sung، نويسنده ,
Issue Information
دوهفته نامه با شماره پیاپی سال 2001
Pages
3
From page
130
To page
132
Abstract
Thin transparent films of diamond have been grown only by chemical vapor deposition (CVD) methods at slow rates. Using a hot filament CVD reactor of large area (30 cm×40 cm), these films were deposited onto highly polished copper substrate at a rate of about 1 μm h−1. The cost of manufacturing thin transparent films of 20 μm thickness may be as low as $1 cm−2. At such a low cost, thin transparent films should have diversified applications, such as X-ray windows, high frequency (up to 10 GHz) SAW filters, and other advanced devices.
Keywords
CVD , Hardness , Chemical synthesis
Journal title
Materials Chemistry and Physics
Serial Year
2001
Journal title
Materials Chemistry and Physics
Record number
1060658
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