• Title of article

    The rapid growth of thin transparent films of diamond

  • Author/Authors

    Hsiao-Kuo Chung، نويسنده , , James C. Sung، نويسنده ,

  • Issue Information
    دوهفته نامه با شماره پیاپی سال 2001
  • Pages
    3
  • From page
    130
  • To page
    132
  • Abstract
    Thin transparent films of diamond have been grown only by chemical vapor deposition (CVD) methods at slow rates. Using a hot filament CVD reactor of large area (30 cm×40 cm), these films were deposited onto highly polished copper substrate at a rate of about 1 μm h−1. The cost of manufacturing thin transparent films of 20 μm thickness may be as low as $1 cm−2. At such a low cost, thin transparent films should have diversified applications, such as X-ray windows, high frequency (up to 10 GHz) SAW filters, and other advanced devices.
  • Keywords
    CVD , Hardness , Chemical synthesis
  • Journal title
    Materials Chemistry and Physics
  • Serial Year
    2001
  • Journal title
    Materials Chemistry and Physics
  • Record number

    1060658