Title of article
Electrical properties of TaxNy films by implementing OES in the sputtering system
Author/Authors
Y.M. Lu، نويسنده , , R.J. Weng، نويسنده , , W.S. Hwang، نويسنده , , Y.S. Yang، نويسنده ,
Issue Information
دوهفته نامه با شماره پیاپی سال 2001
Pages
3
From page
278
To page
280
Abstract
Tantalum nitride has been found to be a promising material for many applications such as diffusion barrier, wear and corrosion-resistance material, as well as precise and stable resistor in silicon-integrated circuits.
Keywords
Sputtering , Nitrides , Thin film
Journal title
Materials Chemistry and Physics
Serial Year
2001
Journal title
Materials Chemistry and Physics
Record number
1060689
Link To Document