Title of article
Double-exposure holographic interferometry technique used for characterization of electrodeposited cobalt oxide thin films
Author/Authors
R.N. Thokale، نويسنده , , P.S. Patil، نويسنده , , M.B. Dongare، نويسنده ,
Issue Information
ماهنامه با شماره پیاپی سال 2002
Pages
7
From page
143
To page
149
Abstract
Double-exposure holographic interferometry (DEHI) technique was used to study the surface deformation of stainless steel substrate, when cobalt oxide was deposited onto it using dc electrodeposition method. The films were deposited by varying the concentrations of CoCl2 solution and the deposition time. It was observed that interference fringes were localized on the surface of substrate when the hologram was transilluminated. It was further noticed that the fringe spacing changes with solution concentration as well as time of deposition. The thickness of deposited film, mass of cobalt oxide deposited on the substrate and rate of mass deposition were evaluated.
Keywords
Cobalt oxide , Electrodeposition , Holographic interferometry , X-ray diffraction , Optical absorption
Journal title
Materials Chemistry and Physics
Serial Year
2002
Journal title
Materials Chemistry and Physics
Record number
1060788
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