Title of article :
Light induced defects in sputtered amorphous silicon thin films
Author/Authors :
M.S. Aida، نويسنده , , F. Youla، نويسنده , , N. Touafek، نويسنده , , D. Nebti، نويسنده , , A. Benzagoutta، نويسنده ,
Issue Information :
ماهنامه با شماره پیاپی سال 2002
Pages :
7
From page :
251
To page :
257
Abstract :
We have investigated the influence of light soaking on the electrical and optical properties of sputtered amorphous silicon thin films. The obtained results have shown that sputtered a-Si:H films, as well as glow discharged material are sensitive to prolonged light exposure. The most important induced states appear during the first 2 h of exposure. From the dark conductivity variation, we inferred that light induced defects are relatively low in hydrogen-rich films. We suggest that the mechanism of defect creation is performed through SiSi weak bonds breaking and that is stabilized by hydrogen involvement.
Keywords :
Thin films , Sputtering , Steabler–Wronski effect , Amorphous silicon
Journal title :
Materials Chemistry and Physics
Serial Year :
2002
Journal title :
Materials Chemistry and Physics
Record number :
1060805
Link To Document :
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