Title of article :
Synthetic study of Al–Ni alloy system using HVEM and ion accelerator
Author/Authors :
H Kinoshita، نويسنده , , H Takahashi، نويسنده , , R Gotthardt، نويسنده ,
Issue Information :
دوهفته نامه با شماره پیاپی سال 2003
Pages :
3
From page :
424
To page :
426
Abstract :
The microstructure changes of aluminum under implantation with Ni+ ions were investigated. The ion implantation was carried out at 250 keV. Needle-like precipitates were formed in the Al matrix after implantation to 0.2×1017 Ni+ cm−2. This precipitate contained between 8.5 and 13.3 at.% Ni. The growth of the precipitates was connected with an amorphous phase under further implantation up to 2×1017 Ni+ cm−2. The concentration of Ni in the amorphous phase was 10.8–12.8 at.%. In order to investigate the phase stability of the precipitate, annealing or electron irradiation experiments were performed in a high voltage electron microscope. The crystalline and the amorphous phases were stable under electron irradiation up to 5 dpa. The crystalline phases were also stable during annealing at 673 K, whereas the amorphous phase was crystallized during annealing at 593 K.
Keywords :
Ion implantation , Metastable phases , Al–Ni system , Amorphous phase
Journal title :
Materials Chemistry and Physics
Serial Year :
2003
Journal title :
Materials Chemistry and Physics
Record number :
1061692
Link To Document :
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