Title of article :
Growth of carbon nanotubes using microwave plasma-enhanced chemical vapor deposition process
Author/Authors :
Ruo-Mei Liu، نويسنده , , Jyh-Ming Ting، نويسنده ,
Issue Information :
دوهفته نامه با شماره پیاپی سال 2003
Pages :
4
From page :
571
To page :
574
Abstract :
Carbon nanotubes were grown on Si substrates using a plasma enhanced chemical vapor deposition technique under various gaseous compositions, microwave powers, and pressures. An iron-containing compound was used as the catalyst. The hydrocarbon used was methane. The resulting carbon nanotubes were examined using scanning electron microscopy and transmission electron microscopy. The diameters of carbon nanotubes (CNTs) were found to be dominated by methane concentration and plasma power. It was also found that the catalyst particles were deformed during the growth of CNTs which led to a sheath growth mechanism.
Keywords :
Carbon nanotubes , CVD , Catalyst , Microwave
Journal title :
Materials Chemistry and Physics
Serial Year :
2003
Journal title :
Materials Chemistry and Physics
Record number :
1061968
Link To Document :
بازگشت