Author/Authors :
Yuan-da Wu، نويسنده , , Guan Hua Xing، نويسنده , , Letian Zhang، نويسنده , , Ai-wu Li، نويسنده , , Wei Zheng، نويسنده , , Guofan Liu، نويسنده , , Yubin Guo، نويسنده , , Yushu Zhang، نويسنده ,
Abstract :
SiO2 thick films were quickly deposited on silicon wafers by flame hydrolysis deposition (FHD) method, followed by consolidation in electric resistance furnace at 1380 °C. The as-deposited films were confirmed to be vitreous silica by means of SEM and X-ray diffraction (XRD). The thickness of the films is up to 37 μm, and the deposition speed is as high as 8 μm min−1. The refractive index and absorbing loss (extinction coefficient) are also measured by spectroscopic ellipsometer.
