Title of article
Cathodic electrodeposition of RuO2 thin films from Ru(III)Cl3 solution
Author/Authors
Bong-Ok Park، نويسنده , , C.D. Lokhande، نويسنده , , Hyung Sang Park، نويسنده , , Kwang-Deog Jung، نويسنده , , Oh-Shim Joo، نويسنده ,
Issue Information
دوهفته نامه با شماره پیاپی سال 2004
Pages
8
From page
59
To page
66
Abstract
Ruthenium oxide (RuO2) films of different thicknesses have been cathodically deposited on titanium substrates under galvanostatic condition from aqueous acidic Ru(III)Cl3 solution. The deposition conditions and structural properties of these films have been studied. The X-ray diffraction (XRD) and transmission electron microscopy (TEM) studies revealed that as-deposited RuO2 film is nanocrystalline. The scanning electron microscopy (SEM) study showed that RuO2 film is porous and the surface morphology changes with film thickness.
Keywords
Ruthenium oxide , Electrodeposition , Thin films , structural studies , SEM and TEM studies
Journal title
Materials Chemistry and Physics
Serial Year
2004
Journal title
Materials Chemistry and Physics
Record number
1062686
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