Title of article :
Vapour transport and inner walls covering in large aspect ratio macropores
Author/Authors :
O. de Melo، نويسنده , , S. Larramendi، نويسنده , , M. Hern?ndez-Vélez، نويسنده ,
Issue Information :
دوهفته نامه با شماره پیاپی سال 2012
Pages :
7
From page :
954
To page :
960
Abstract :
A model for the covering of the inner surfaces of narrow and large aspect ratio tubes is developed. It considers diffusive vapour transport toward the bottom of the tubes and self-regulated adsorption at their walls. According to the growth conditions and the tubes geometry, Knudsen diffusion approximation is used. Pressure and coverage profiles, calculated for different geometries and sticking coefficients, allowed discriminating two well defined regimes. In these regimes, surface reaction or vapour diffusion are the corresponding limiting processes; then, a simple equation to estimate the walls covering time as a function of the growth parameters and tubes geometry is proposed. This model allowed revealing the main features guiding the deposition of CdSe semiconductor within commercial alumina membranes by the Isothermal Close Space Sublimation technique.
Keywords :
A. Semiconductors , B. Vapour deposition , C. Computer modelling and simulation , D. Adsorption
Journal title :
Materials Chemistry and Physics
Serial Year :
2012
Journal title :
Materials Chemistry and Physics
Record number :
1064281
Link To Document :
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