Microstructure and optical properties of GaN films on sapphire substrates

Transmission electron microscopy (TEM), double crystal X-ray diffraction (XRD), photoluminescence (PL) and Raman scattering measurement were applied to study the correlation between the microstructure and material properties of the GaN films grown by light radiation heating metalorganic chemical vapor deposition (LRH-MOCVD), using GaN buffer layer on sapphire substrates. Corresponding to the density of the threading dislocation (TD) increasing approximately one order, the yellow luminescence (YL) intensity was strengthened from negligible to two orders higher than the band-edge emission intensity. The full width of half maximum (FWHM) of GaN (0002) peak of the XRD rocking curve was widened from 11 to 15 min, and in Raman spectra, the width of E2 mode is broadened from 5 cm−1 to 7 cm−1. A ‘zippers’ structure of GaN buffer layer was discovered by high-resolution electron microscope (HREM).