Trimming phase and birefringence errors in planar lightwave circuits with deep ultraviolet femtosecond laser

A deep ultraviolet femtosecond laser was employed to trim phase and birefringence errors in silica planar lightwave circuits. A permanent refractive index change of ~3.8*10/sup -4/ and a birefringence change of 1.0*10/sup -4/ were induced in hydrogen-free Mach-Zehnder planar waveguide circuits. The ultrafast laser enhances the ultraviolet photosensitivity response in silica waveguides by two orders of magnitude greater than that of a nanosecond 248 nm KrF excimer laser.