Author/Authors :
H.، Liu, Kelly نويسنده , , R.، Baets, نويسنده , , P.I.، Borel, نويسنده , , L.H.، Frandsen, نويسنده , , A.، Harpth, نويسنده , , J.B.، Leon, نويسنده , , M.، Kristensen, نويسنده , , W.، Bogaerts, نويسنده , , P.، Dumon, نويسنده , , V.، Wiaux, نويسنده , , J.، Wouters, نويسنده , , S.، Beckx, نويسنده ,
Abstract :
An effective design principle has been applied to photonic crystal waveguide bends fabricated in silicon-on-insulator material using deep UV lithography resulting in a large increase in the low-loss bandwidth of the bends. Furthermore, it is experimentally demonstrated that the absolute bandwidth range can be adjusted in a post-fabrication thermal oxidation process.
