High load AFM friction and wear experiments on V2O5 thin films

High load friction and wear experiments by means of atomic force microscopy were carried out at the surface of highly (0 0 1) oriented vanadium oxide V2O5 thin films deposited on silicon by reactive magnetron sputtering. Microscopic friction coefficient was estimated for wide range of loads. The nature of surface wear due to multiple, high load scanning is presented and discussed.