Fullerenes as the parent molecule for the deposition of tetrahedral carbon Original Research Article

Amorphous carbon has been deposited by employing a fullerene ion beam and a radio-frequency excited fullerene argon plasma and nanocrystalline diamond films by a fullerene argon microwave plasma. The samples are characterized regarding their electronic properties by means of C ls core level excitation spectra and photoelectron spectra of the C ls core level and the valence band.