Cold remote nitrogen plasma effects on pulsed laser deposited CNX films characteristics Original Research Article

Carbon nitride films were deposited by ablation of carbon molecular fragments from a graphite targets on a silicon substrate after few pulses of a localized transversely excited atmospheric pressure CO2 laser. Deposition media were either a non excited nitrogen flow or cold remote plasma of nitrogen. Fourier transform infrared spectra of the deposited films show a very efficient nitrogen fixation with CN bands characteristic of tetrahedral carbon. The effect of the distance of deposition zone from the discharge is also discussed.