Title of article :
The chemical bonding state of nitrogen in kapton-derived carbon film and its effect on the graphitization process Original Research Article
Author/Authors :
Michio Inagaki، نويسنده , , Hiroto Tachikawa، نويسنده , , Tamaki Nakahashi، نويسنده , , Hidetaka Konno، نويسنده , , Yoshihiro Hishiyama، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1998
Abstract :
The chemical bonding state of the nitrogen which remains in the carbon films derived from a polyimide Kapton film was studied by X-ray photoelectron spectroscope and related to the changes in structure and transport properties. The nitrogen remaining after heat treatment up to 2200 °C was in a tertiary bonding state, replacing carbon atoms in hexagonal layers, which was supported by theoretical calculation based on ab-initio molecular orbital theory. The departure of substituted nitrogen atoms from hexagonal layers showed a good correspondence with structure development and changes in transport properties, the presence of nitrogen depressing the developments in structure and transport properties. After the departure of nitrogen above 2300 °C graphitization of the films was very remarkable.
Keywords :
X-ray diffraction , C. crystal structure , galvanomagnetic properties , B. graphitization , C. photoelectron spectroscope