Title of article :
Characteristics of α-SiC: H films produced by the r.f. plasma pulsed deposition method — Effect of deposition temperature
Author/Authors :
H. Yamada، نويسنده , , O. Tsuji، نويسنده ,
Issue Information :
روزنامه با شماره پیاپی سال 1998
Pages :
1
From page :
1874
To page :
1874
Journal title :
Carbon
Serial Year :
1998
Journal title :
Carbon
Record number :
1117788
Link To Document :
https://search.isc.ac/dl/search/defaultta.aspx?DTC=10&DC=1117788
