Synthesis of oriented nanotube films by chemical vapor deposition Original Research Article

Oriented nanotube films (20–35 μm thick) were synthesised on flat silicon substrates by chemical vapor deposition (CVD) of a gas mixture of acetylene and nitrogen. For the CVD we used metal oxide clusters formed by spin coating an iron(III) nitrate ethanol solution onto a silicon substrate and subsequent heating. The cluster density and its effects on the nanotube density were investigated as a function of the iron(III) nitrate concentration and the synthesis temperature. A high nanotube density was achieved with a high density of iron oxide clusters as nucleation centres for the growth of nanotubes. The cluster density was controlled by the iron(III) concentration of the ethanolic coating solution and by the synthesis temperature. The perpendicular orientation of the nanotubes with respect to the substrate surface is attributed to a high density of nanotubes.